Si diffusion induced adhesion and corrosion resistance in annealed RF sputtered SiC films on graphite substrate

Abstract

Silicon carbide (SiC) is one of the promising candidates for graphite protection in different applications involving high temperatures and a highly corrosive environment. An ideal Silicon carbide coating should withstand a corrosive environment without compromising its adhesion. Herein, RF magnetron sputtered silicon-rich SiC thin films were deposited on a graphite substrate followed by annealing at 1000 °C, 1200 °C, and 1400 °C in an inert atmosphere. The impact of annealing temperature on microstructure, adhesion and chemical stability of SiC thin films was demonstrated. Different analytical techniques like Scanning electron microscopy (SEM), X-Ray Diffraction (XRD), Fourier's Transform Infrared (FTIR) spectroscopy and nano-indentation were used to study microstructural evaluation and mechanical characteristics. Moreover, the electrochemical analysis (Tafel and Electrochemical impedance spectroscopy) was performed in 3.5% NaCl solution. The microstructural analysis revealed that the amorphous SiC thin film turned into a crystalline and dense film upon annealing. Scanning electron micrographs showed that silicon-rich regions at SiC film surface started to disappear as Si diffuses into graphite matrix at elevated temperatures. Both these factors contributed to improvement in the adhesion of SiC coating with graphite substrate as annealing temperature increased. In addition, the nano-indentation hardness of 5.2 GPa was obtained for as grown sample, which decreased at 1000 °C, and then increased at 1200 °C and 1400 °C. Furthermore, the electrochemical analysis confirmed the enhancement in corrosion resistance upon annealing at a temperature of 1200 °C and 1400 °C due to Si diffusion and film compactness in these samples.