Abstract
The 3He activation method for oxygen determination was applied to chalcogenide materials such as Ge 28Sb 12Se 60 and Ge 33As 12Se 55. Attention was focused on the optimization of the 3He bombardment energy for non-destructive oxygen determination and the validity of the post-irradiation chemical etch used for removing surface oxygen contamination. The procedure developed was tested on a series of chalcogenide glasses. The detection limit for this non-destructive technique using ~6-MeV 3He is estimated at ~1 ppm of oxygen.
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