Shaped Beams For Integrated Circuit Fabrication

Abstract

Numerous types of electron-beam lithography systems have been designed and built over the years. The variable shaped probe with vector deflection type has emerged as the most common of the recent designs. This architecture's popularity stems primarily from the superior writing speed for any given resolution and dose requirement by virtue of the ability to expose numerous pattern elements in parallel while at the same time retaining the flexibility of digital pattern description. High currents for rapid registration mark acquisition and relatively low circuit speed requirements are also advantages of the variable shaped spot vector deflection design.