Shadow effect in dual‐source thermally evaporated perovskite patterns

Abstract

AbstractPerovskite light‐emitting diodes (PeLEDs) have recently emerged as a potential next‐generation display technology due to their wide color gamut, high external quantum efficiency (EQE), and low fabrication cost. The thermal evaporation process with no solvent involvement and offers low substrate selectivity and high compatibility with production lines has attracted significant academic interest. However, in thermal evaporation processes, the shadow effect greatly affects the deposition size and positioning accuracy of the patterns, consequently impacting the effective device area and process repeatability of PeLEDs. In this study, we calculated the shadow distance during the dual‐source thermal evaporation and analyzed the issues of misalignment and size deviation caused by shadow effects. Based on the calculation of shadow distance, we increased the substrate height from 33 to 38 cm to enhance the deposition angle. This adjustment led to an improvement in the characteristic parameter W1/Wdot from 0.178 to 0.365 during perovskite deposition. As a result, we successfully obtained a high‐resolution perovskite array with uniform morphology and photofluorescence (PL) emission at 600 pixels per inch (ppi). This demonstrated the reliable calculation and analysis of shadow distance, which is effective for fine deposition of high‐resolution perovskite patterns and PeLEDs.