Abstract

Modern development of nanotechnology as one of the modern science priority directions is impossible to imagine without the use of vacuum systems and technologies. And the better the vacuum (lower the pressure), the “cleaner” we get a surface, which is very important for nanotechnology. Determination of the cleanliness of the surface or the amount of molecular layers of adsorbed gases on the working surface of the products especially in industry, where the cleanliness of the working surface is a key parameter of the technological process and has a significant influence on the output parameters of the final product is the main goal of this work.

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