Abstract

An electrochemical biosensor for mimicking the metal-mediated DNA damage pathway in situ was presented. The Fenton reagents (H 2O 2 and iron ion) for the DNA damage were generated in situ with a constant rate from the sensing film. H 2O 2 and iron ion reacted further together to yield hydroxyl radical, which attacked DNA in the film. These courses of DNA damage were just like those happened in organism. The DNA damage was detected by monitoring the differential pulse voltammetric response of an electrochemical indicator, Co(phen) 3 3+. Another electrochemical indicator, Ru(NH 3) 6 3+, was also used for monitoring the DNA damage as a complementary means and the minimal detectable amount of DNA damage was 0.16 μg. The biosensor had good reproducibility. After this biosensor was used for 11 times, 90% of the first detection signal was obtained.

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