Abstract
The results of SEM investigations of structured (pillared) layers formed by electrochemical processing of Al-Ta thin film sandwiches are presented. The basic parameters of the internal microstructure and natural morphology of Al anodic oxide films and pillared structured layers formed on them are given. Two methods of multistep electrochemical processing of aluminum films during porous anodic oxide films formation were developed to improve the morphology of pillared microstructures. Analysis of experimental data shows that the developed methods allow us to obtain the ordered pillared microstructures with high aspect ratio (≥ 4), radius 15 to 35 nm, and pillar density (3.0 to 8.5) x 10 9 cm -2 . High reproducibility of physical and morphological parameters of the structured layers for large-area samples is achieved. Such pillared matrices can be used for manufacturing of the microelements based on the mesoscopic and quantum effects: solar cells, controlled and uncontrolled emitter matrices for flat panel displays and emission cathodes, cathode luminescent displays, functional screens and polarizors for optoelectronics, etc.
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