Abstract
In this investigation, titanium oxide films were deposited on silicon substrate by liquid phase deposition using a deposition solution of ammonium hexafluoro-titanate and boric acid. The concentration of the boric acid in the deposition solution controls the rate of deposition of titanium oxide film. The titanium oxide film becomes superhydrophilic with a contact angle around 4° after irradiation by UV light. The average reflectance is 5.3% at wavelengths from 400 to 800nm. Superior wetting and antireflection properties make the film suitable for use in silicon-based solar cells.
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