Abstract
Stable polystyrene (PS) colloidal crystal micropatterns were fabricated from photosensitive polymer diazoresin (DR) using a self-assembly technique. The micropatterns were realized on layer-by-layer (LBL) self-assembled film after UV exposure through a photomask. The patterns were characterized with optical microscopy and scanning electron microscopy. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable and well-defined micropatterns of colloidal crystals.
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