Abstract
The surface of a fused silica and oxidized silicon wafer (SiO2/Si(100)) was treated with (3-aminopropyl)triethoxysilane in solution. The silane coupling agent (SCA) produces multilayers with variable thickness (6-100 Å) depending upon the dipping time. The aminosilane layers were allowed to react with 4-nitrobenzaldehyde, and formation of the corresponding imine was confirmed by UV-vis spectroscopy. In aqueous medium the imine was easily hydrolyzed to regenerate the amine group and the aldehyde. Surface density of the amine was calculated from the amount of produced 4-nitrobenzaldehyde. Tilt angles of the chromophore, the imine, obtained from the surface density and Asurf, absorbance of the derivatized substrate, are 23-32°.
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