Abstract
We here demonstrate a facile approach of one-step to obtain the complex wrinkling patterned surface of the photocuring coating by using thiol and fluorocarbon chains containing POSS (F2-POSS-SH6) as reactive nanoadditive. F2-POSS-SH6 can self-assemble into the top layer of the UV-curing liquid resin. As a result, the mismatch of shrinkage caused by the different types of photo-cross-linking reaction between the top layer and bulk layer leads to formation of the wrinkling pattern. The characteristic wavelength (λ) and amplitude (A) are linearly dependent on the concentration of F2-POSS-SH6. The resulting surface exhibits superlow surface energy (4.1 mN/m) when the concentration of F2-POSS-SH6 is only 1%. The feasibility and generality of this approach for the excellent hydrophobic and oleophobic surface will undoubtedly find practical application in photocuring coating with functions such as self-cleaning.
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