Self-organized phase-transition lithography for all-inorganic photonic textures

Abstract

Realizing general processing applicable to various materials by one basic tool has long been considered a distant dream. Fortunately, ultrafast laser–matter interaction has emerged as a highly universal platform with unprecedented optical phenomena and provided implementation paths for advanced manufacturing with novel functionalities. Here, we report the establishment of a three-dimensional (3D) focal-area interference field actively induced by a single ultrafast laser in transparent dielectrics. Relying on this, we demonstrate a radically new approach of self-organized phase-transition lithography (SOPTL) to achieve super-resolution construction of embedded all-inorganic photonic textures with extremely high efficiency. The generated textures exhibit a tunable photonic bandgap (PBG) in a wide range from ~1.3 to ~2 μm. More complicated interlaced textures with adjustable structural features can be fabricated within a few seconds, which is not attainable with any other conventional techniques. Evidence suggests that the SOPTL is extendable to more than one material system. This study augments light–matter interaction physics, offers a promising approach for constructing robust photonic devices, and opens up a new research direction in advanced lithography.