Abstract
Surface modification of GaSb(001) induced by low energy (2 to 4.5 keV) Ar ion beam irradiation has been investigated by means of atomic force microscopy (C-AFM). It has been found, that depending on the ion beam parameters, i.e. energy and fluence, narrow size distribution of nanostructure patterns have been developed on the irradiated surfaces. Particularly, at incidence angle of 80o with respect to the surface normal, remarkably ordered ripple like structures are formed. The wave vector of the ripple pattern is oriented perpendicular to the direction of the ion beam projection on the irradiated surface. It has been also found, that the surface roughness, in terms of RMS, is initially a decreasing function of the ion fluence, but above medium fluence (of 1×1016 ions/cm2) it increases with the irradiation time. The results are discussed in terms of ballistic processes of sputtering and existing theories describing the ion beam induced surface modification.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
