Year-end Sale % OFF 
Abstract
Low-energy self-ion bombardment effects on the crystallographic orientation and oxidation behaviours of arc-ion-plated pure Cr films were investigated. Microstructurally compact Cr films as observed by SEM were obtained under ion-bombardment energy of 50–250 eV. Stronger ion bombardment induced crystallographic orientation of Cr (200) and slight self-sputtering effect in the Cr films. Oxidation of the Cr films at 900 °C showed that the stronger self-ion bombardment induced formation of the more compact chromia scales with significantly lowered growth rate, indicating that self-ion bombardment can be an effective approach to improve the oxidation resistance of metal films.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
