Self-consistent simulation of very high frequency capacitively coupled plasmas

Abstract

A two-dimensional plasma model that includes the full set of Maxwell equations is used to understand the physics of very high frequency capacitively coupled plasmas. The effect of radio frequency (RF) source power, inter-electrode gap and gas mixture (Ar, Ar/SF6, Ar/CF4) on the plasma characteristics is investigated. The computational results show that the plasma spatial profile is influenced by both electrostatic and electromagnetic effects. The electrostatic power deposition is stronger at the electrode edges due to electric field enhancement at corners. Therefore, when the electrostatic effects are dominant, the plasma density peaks off-axis. Due to a standing electromagnetic wave in the chamber, the electron density peak moves to the chamber center under conditions where electromagnetic effects become strong. Inductive heating due to the radial electromagnetic electric field can also influence the plasma spatial profile. The relative importance of electromagnetic and electrostatic effects is found to be a function of the RF source power, the inter-electrode gap and the plasma electronegativity. While the electron density peaks on-axis at a low source power, inductive power deposition at higher source powers shifts the electron density peak towards the electrode edge. Electrostatic power deposition makes the plasma more uniform at smaller inter-electrode gaps. Due to a lower electron density and a larger applied RF potential, electrostatic effects become more dominant in electronegative discharges.