Abstract

We developed a self-assembly process of SiO2 particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow dissolution of methanol into hexane caused shrinkage of molds to form micropatterns of close-packed SiO2 particle assemblies.We further developed spherical particle assemblies and micropatterns of them. Hydrophilic regions of a patterned self-assembled monolayer were covered with methanol solution containing SiO2 particles and immersed in decalin. Particles were assembled to form spherical shapes and consequently, micropatterns of spherical particle assemblies were successfully fabricated through self-assembly.This result is a step toward the realization of nano/micro periodic structures for next-generation photonic devices by a self-assembly process.† This report published originally in Japanese in J. Soc. Powder Technology, Japan, 43, 362-371 (2006), is published in KONA with the permission of the editorial committee of the Soc. Powder Technology, Japan.

Highlights

  • We further developed spherical particle assemblies and micropatterns of them

  • H

  • We developed patterning process of colloidal crystals by the use of self-assembly

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Summary

1.Introduction

“Self-assembly” has been attracting much attention as the generation nano/micro fabrication process. Colloidal cr ystals were fabricated by self-assembly of nano/micro particles to form closed pack structure such as fcc(face-centered cubic) or hcp(hexagonal closed packing). H

Particle Assembly for Photonic Cr ystal
SAM Preparation
Preparation of 2D pattern of colloidal photonic cr ystals
Structure evaluation
Self-assembly into spherical particle assembly
Formation process of small clusters of particles
Linear disclinations on spherical particle assemblies
Micropatterning of spherical particle assemblies
Findings
Conclusion
Full Text
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