Abstract

Versatile indium oxide tubular nanostructures (well-aligned nanotube arrays, flower-liketubular structures, and square nanotubes) were fabricated by a facile and reliable chemicalvapor deposition (CVD) technique, taking advantage of the self-assembly property andsubstrate-induced epitaxial growth mechanism. The technique has a few advantages, suchas low growth temperature, nonexistence of catalyst, template-free synthesis, directbonding to the semiconductor substrates, etc. This strategy might extend the approach ofsynthesizing desirable nanostructures of other important low-melting metal oxides forpotential applications.

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