Abstract
Fabrication of sub-10 nm topographical guiding patterns, block copolymer directed self-assembly, thorough morphology analysis and free energy modelling.
Highlights
Block copolymers consist of two chemically different polymer chains connected by a covalent bond.[8]
The work-flow sketched in the top images is characterized by a guiding pattern feature width below 10 nm, which is in the size range of the block copolymer domain
Based on the analysis presented in the Results section of this paper, we conclude that the design rule for the successful alignment of block copolymers in topographical guiding patterns with feature sizes in the range of individual block copolymer domains differs fundamentally from those for wide topographical guiding patterns
Summary
Block copolymers consist of two chemically different polymer chains connected by a covalent bond.[8] Upon heating the material above its glass transition temperature, it selfassembles into an ordered phase of well-defined structures. Block copolymers exhibit a complex phase behavior and as a function of the relative and absolute chain lengths, they are capable of assembling into diverse morphologies, like spherical, cylindrical, gyroid or lamellar structures.[9,10,11,12] Due to large. The most frequently used strategies to direct the self-assembly of block copolymers are the fabrication of chemical patterns, referred to as chemoepitaxy,[2,14,15,16,17] and the fabrication of topographical patterns, referred to as graphoepitaxy.[5,18,19,20,21]
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