Abstract
Abstract Attempts were made to optimize the electrochemical anodization process for the formation of high-density, regular and straight nanopore arrays on InP. The structure, shape and size of the pores were very sensitive to substrate orientations, electrolyte concentrations and anodization voltages. Among (1 1 1)A, (1 1 1)B and (0 0 1) substrate orientations, the most uniform and most straight nanopore arrays were obtained on (0 0 1) substrates at anodization voltages of 5–7 V by using 1.0–1.5 M HCl electrolyte containing HNO 3 . The pore depth could be controlled up to 80 μm by the anodization time.
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