Abstract
Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene- block-methyl methacrylate) (PS- b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW = 67,100 g mol −1. First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes, dots and nanopillars.
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