Selective immobilization of carbon micro coils on patterned substrates and their electrochemical behavior on ITO substrate

Abstract

The selective immobilization of carbon micro coils (CMCs) has been investigated on patterned silicon substrates. A patterned silicon substrate was prepared by UV-irradiation under a photo mask onto amine-terminated monolayer on a silicon substrate. It was then dipped into a chloroform dispersion of CMCs which were ahead oxidized by phosphorous pentachloride. The selective, chemical anchoring of CMCs with high surface coverage was achieved on the amine-terminated pattern on the silicon substrate through amide covalent bonding. The uniform immobilization of CMCs on an indium tin oxide (ITO) substrate was accomplished through amide bonding between oxidized CMC and amine-terminated monolayer on the substrate. Such film of CMCs promoted the electric behavior of the ITO substrate.