Selective growth of nanometre scale structures with high resolution using thermal energy inAFM lithography

Abstract

We report the effect of applied thermal energy in the fabrication of protruded nanostructures ontantalum (Ta) thin films using atomic force microscope (AFM) lithography and the fabricationof nanopatterns of Ta thin films by a dry etching process of protruded tantalum oxide(Ta2O5). Oxidized nanostructures with a high aspect ratio were successfully fabricated at hightemperature by applying thermal energy. The lithographic speed of fabrication ofprotruded nanostructures was dramatically improved by the enhancement of electrontransfer depending on the applied thermal energy and directional diffusion ofOH− ions depending on the increase of temperature. Nanopatterns of Ta with a high angle slope (over80°) were fabricated byselective dry etching of Ta2O5.