Abstract
Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO2, ALD-Al2O3 proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al2O3 substrates were demonstrated by MOCVD loading with [(η5-C5H5)Pd(η3-C3H5)] as Pd precursor to finally yield the palladium-loaded thin film material {Pd@MOF-5}/Al2O3 as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.
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