Abstract
General purpose patterning based on selective dewetting with an elastomeric mold is described. Several well‐defined nanostructures obtained by this method are presented (see Figure for an example). Unlike other patterning techniques, the same mold can be used to generate features ranging in size from the nanometer to the micrometer, simply by changing the duration of dewetting.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
