Abstract
In this paper, we present that the two kinds of self-assembled monolayers (SAMs) can be patterned on a Si substrate by the UV irradiation or scanning probe microscope (SPM) lithography technique. Furthermore, we can obtain selective patterning of electroless Ni films by using the difference between the functional groups of SAMs and the submicron-size electroless pattern fabricated by SPM lithography. The mechanism of selective deposition is discussed referring to the X-ray photoemission spectroscopy (XPS) results.
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