Abstract
In this article, we have used boric acid as a source to form the solar cell emitter in a selective way. Moreover, in order to optimize the process, the conditions of boron diffusion were investigated. It was found that for 5% boric acid in deionized (DI) water, the spinning speed of 3000 rpm for 15 s and dry-out process at 200 °C are the most appropriate conditions. Additionally, by using the boric acid source, a selective doping method was developed in this study. Therefore, we have demonstrated that it is possible to perform both light and heavy (under contacts) dopings on different areas of the wafer without any extra masking layer (e.g. silicon dioxide) and undergoing only one drive-in process.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Materials Science: Materials in Electronics
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
