Selective Area Epitaxy of GaN Nanostructures: MBE Growth and Morphological Analysis

Abstract

This work presents the selective area epitaxy of GaN nanostructures grown on Ga-polar GaN/sapphire substrates by plasma-assisted molecular beam epitaxy. We demonstrate three types of nanostructures, including nanowires, nanofins, and nanorings on GaN-on-sapphire templates as well as investigate the ways of controlling their morphology, and orientation of sidewall plus top facets. A range of growth conditions including low to high Ga flux were employed during selective area epitaxy to develop these nanostructures with homogenous geometry and near vertical and smooth sidewalls. Using appropriate growth conditions and mask patterning orientations, nonpolar nanofin grids containing both/either m-/a-planes with as low as 260 nm fin width and up to six interconnects are demonstrated with smooth sidewalls. Based on these experimental results, we developed a growth model that takes different sidewall facets and orientations into account. The model generalizes the experimental results well and explains the growth conditions for the nanostructures. This study serves to advance the understanding of selective area epitaxy for defining complex III-nitride nanostructures that constitute an active area of research and development in the fields of nanotechnology and nanoscience.