Abstract
With the rapid evolution of new engineered surfaces, there is a strong need for developing strategies for selection of right manufacturing and metrology tools, in order to manufacture and measure/characterise these surfaces at different scales. Recent technology trends like miniaturisation and multi–scale modelling have further increased the need to better understand manufacturing and metrology equipments to provide functional surfaces. Amplitude–wavelength (AW) diagrams have been used to characterise instruments and processes in a common domain. Typically AW diagrams are generated assuming that within the limiting lines, the capability of the system is uniform. But various studies have revealed non–linearity in the capabilities, which can be included in the AW diagrams using a third axis and developing 3D AW diagrams. This paper discusses the proposed methodology to develop 3D AW diagrams for measurement systems, using instrument transfer function (ITF) as a main contributor to system capability.
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