Abstract
In this work CdS:F and CdS:O thin films were studied. Films were prepared by the RF-sputtering technique in an atmosphere containing Ar mixed with CHF3 or O2 reactive gases. XPS measurements showed that CdS:F films are composed by CdS and CdF2 while CdS:O comprises the CdS, CdSO4, CdSO3 and CdO2 compounds. Modulation of optical properties was achieved by changing the reactive gas concentration during deposition. According to the transmittance, bandgap and refractive index values, it was concluded that CdS:O thin films are more suitable for window layer application.
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