Seeded Photoinitiated Polymerization-Induced Self-Assembly: Cylindrical Micelles with Patchy Structures Prepared via the Chain Extension of a Third Block.

Abstract

Cylindrical micelles formed by the self-assembly of block copolymers are of interest for a wide range of applications. In this study, aqueous seeded photoinitiated polymerization-induced self-assembly (photo-PISA) is developed for the preparation of cylindrical block copolymer micelles with patchy structures at high solids contents. Cross-linked cylindrical block copolymer micelles prepared by photo-PISA are used as seeds for further chain extension. Surface roughness of the patchy cylindrical block copolymer micelles can be controlled by varying degree of polymerization (DP) of the third block. The obtained patchy cylindrical micelles can be further functionalized via the modification of the third block. Due to the high solids content of patchy cylindrical micelles prepared by seeded photo-PISA (10% w/w or higher), we expect that this study will greatly expand the promise of PISA for the large-scale preparation of cylindrical micelles with well-defined structures.