Abstract

We report a simple method to pattern wetting properties on thin films of periodic mesoporous organosilica (PMO). A hydrophobic methane PMO thin film was covered by masks and exposed to oxygen plasma to make the unmasked area hydrophilic. The wettability patterns could be revealed only when the films were immersed in water or exposed to moisture. We expect that our method would extend the utility of PMO to such areas as sensing and information security.

Highlights

  • We use methane periodic mesoporous organosilica (PMO), with a –CH2– bridge, as an archetype to demonstrate our patterning technique because at a temperature higher than 400 °C, the transformation of bridging – CH2– groups into terminal –CH3 groups hydrophobizes the surface of the pore wall[10,16,17] and exposes the terminal methyl groups for subsequent plasma treatment

  • We have demonstrated that plasma treatment of thermally-processed thin films of methane PMO is a fast and clean method to create patterns of wettability

  • We demonstrated a few interesting phenomena of wetting dynamics

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Summary

Introduction

Patterned porous materials combine the characteristics of a pattern, such as shape and dimensions, with the characteristics of a porous material, such as high surface area and large pore volume, to deliver functions that promise applications in sensors, catalysis, photonics, displays, microfluidics, and electronics.[1,2,3,4,5,6] Patterns of ordered mesoporous materials have been produced using self-assembled monolayers (SAMs),[2,7,8] photolithography,[4] micromolding in capillary,[1,6] direct writing,[5] ink-jet printing[5], and scanning electrochemical microscopy.[9]. We report a method to create patterns of different wettability on thin films of mesoporous organosilica.

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