Abstract
We report substantial improvement of the field emission properties from aligned carbon nanotubes grown on aligned carbon nanofibres by a two-stage plasma enhanced chemical vapour deposition (PECVD) process. The threshold field decreased from 15.0 to 3.6 V/microm after the secondary growth. The field enhancement factor increased from 240 to 1480. This technique allows for superior emission of electrons for carbon nanotube/nanofibre arrays grown directly on highly doped silicon for direct integration in large area displays.
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