Abstract
Using a dynamic sheath model, we have studied the secondary-electronemission effects at one-dimensional planar dielectric surface in plasmaimmersion ion implantation. The temporal evolution of the sheaththickness, the surface potential of dielectric, and the ions doseaccumulated on the dielectric surface are obtained. The numericalresults demonstrate that the charging effects are greatly enhanced by thesecondary electron emission effects, so the sheath thickness becomesthinner, the surface potential of dielectric decreases fast and theions dose accumulated on the dielectric surface significantlyincreases.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
