Secondary-deposited elevated self-assembling nanosphere lithography: A powerful tool to achieve heterostructure metasurface

Abstract

The heterostructure integration of nanostructures, which can involve higher freedom of degree by applying two or more materials into one integrated photonic or electromagnetic devices, attracted extensively increasing attention among the communities of electrons, photonics, materials science, and engineering. However, it is still a challenging topic to realize heterostructure integration with accurate micro–nano-scale geometry in a large area. Here, we propose the secondary-deposited elevated self-assembling nanosphere lithography for large-area heterostructure integration of plasmonic metasurface. As the proof of concept, an infrared metasurface composed of Au–Ag crescent pairs is realized in the practice. By adjusting the evaporation angle, crescent pairs with different morphologies can be freely machined without changing masks. Optical characterization and numerical results show that the heterostructure crescent-pair metasurface owns uniform and stable geometrical properties and flexible capability on infrared optical field modulation. Our work enriches the degree of freedom of nano-structure-based optical devices and paves the heterostructure integrated metasurface to potential industrial applications with large dimension, low cost, and fast production.