Abstract
This paper significantly extends previous studies to the transition regime by employing the second-order slip boundary conditions. A simple analytical model with second-order slip boundary conditions for a normalized Poiseuille number is proposed. The model can be applied to either rarefied gas flows or apparent liquid slip flows. The developed simple models can be used to predict the Poiseuille number, mass flow rate, tangential momentum accommodation coefficient, pressure distribution of gaseous flow in noncircular microchannels and nanochannels by the research community for the practical engineering design of microchannels and nanochannels. The developed second-order models are preferable since the difficulty and “investment” is negligible compared with the cost of alternative methods such as molecular simulations or solutions of Boltzmann equation. Navier–Stokes equations with second-order slip models can be used to predict quantities of engineering interest such as the Poiseuille number, tangential momentum accommodation coefficient, mass flow rate, pressure distribution, and pressure drop beyond its typically acknowledged limit of application. The appropriate or effective second-order slip coefficients include the contribution of the Knudsen layers in order to capture the complete solution of the Boltzmann equation for the Poiseuille number, mass flow rate, and pressure distribution. It could be reasonable that various researchers proposed different second-order slip coefficients because the values are naturally different in different Knudsen number regimes. It is analytically shown that the Knudsen’s minimum can be predicted with the second-order model and the Knudsen value of the occurrence of Knudsen’s minimum depends on inlet and outlet pressure ratio. The compressibility and rarefaction effects on mass flow rate and the curvature of the pressure distribution by employing first-order and second-order slip flow models are analyzed and compared. The condition of linear pressure distribution is given.
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