Abstract
The effect of bulk boron incorporation on the second-harmonic generation (SHG) spectrum of Si(001) films grown epitaxially by chemical vapor deposition is studied as a function of doping level and temperature. At room temperature, boron doping (NA∼1018 cm−3) strongly enhances and blueshifts the E1 resonance of the second-harmonic generation spectra to 3.4 eV. Surface hydrogen termination reverses this effect. The observed doping and temperature dependence are modeled as electric-field-induced SHG in the bulk depletion region. The results suggest applications of SHG as an in situ, noninvasive probe of electrically active dopants.
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