Abstract
Al-doped 4H and 6H epitaxial layers have been implanted with 200 keV hydrogen or irradiated with 1 MeV electrons. Heat treatments have been carried out up to 1000 °C and electrical characterization, by means of deep level transient spectroscopy (DLTS), has been performed after every annealing treatment in the 100-750 K temperature range. We have detected several deep levels and the possible involvement of hydrogen in the microscopic structure of these defects is discussed in the light of their thermal stability and previous results found in the literature. All the detected defects, except for a level located at 0.55 eV above the valence band (Ev), do not display any electric field dependence of their emission time constant.
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