Abstract
PVA brushes are widely used for cleaning semiconductor device surfaces. PVA brushes are a soft porous polymer which can be absorb much amount of water. In this review, we briefly introduce the proposed cleaning mechanism. Then some results of frictional analysis of PVA brushes are described. In the frictional analysis, viscoelastic behavior of the brush, surface wettability of a plate, and brush deformation during scrubbing were important. In addition, we introduce a visualization result of real contact area between PVA brush and contact surface.
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