Screw threading dislocations in AlN: Structural and electronic properties of In and O doped material

Abstract

Density functional theory calculations were performed on undoped AlN screw threading dislocations (TDs) as well as TDs doped by indium and oxygen, prompted by integrated experiments through transmission electron microscopy and spectroscopic techniques demonstrating enhanced In and O concentrations in screw dislocation cores. It is revealed that screw TDs act as conduction pathways to charge carriers, introducing multiple levels in the bandgap due to overstrained, dangling, and “wrong” bonds formed even in the undoped cores. The presence of impurities and especially metallic In elevates the metal-like electronic structure of the distorted material and promotes the conductivity along the dislocation line. Hence screw dislocations in AlN are established as highly prominent conductive nanowires in semiconducting thin films and prospects for novel, highly functional nano-device materials through exploitation of screw TDs are attested.