Scratching properties of nickel-iron thin film and silicon using atomic force microscopy

Abstract

Atomic force microscopy (AFM) is well known for its ability for nanopatterning many different materials. The patterning technique using an AFM tip as a scratch tool, known as scratch nanolithography, is used to study the scratch characteristics of 80% Permalloy thin film and silicon, with the emphasis on establishing their scratchability or the nanoscale machinability. The effects of the scratch parameters, including the applied tip force, scratch speed, and number of scratches, on the size of the scratched geometry were specifically evaluated. The primary factors that measure the scratchability were then identified and the governing material properties for scratchability were evaluated. To demonstrate its versatility, the scratching technique was applied to fabricate a NiFe-based nanoconstriction, which is used for many ferromagnetic devices. All results indicated that NiFe thin film has much better scratchability than that of Si and the scratched groove geometry can be accurately correlated with and precisely controlled by the tip normal force.