Scheduling of automated wet-etch stations

Abstract

Semiconductor manufacturing has recently attracted an increased attention in process optimization research. Various MILP and constraint programming methods were published to solve the scheduling problem arising in the wet-etching systems. In the present work, improvements are given to these state-of- the-art models, furthermore, the general purpose solver of the S-graph framework (Sanmarti et al. 2002) is applied to wet-etch station scheduling.