Abstract
This chapter presents the required features of probe tips for scanning probe lithography (SPL) and some novel methods for tip fabrication. For both field-induced oxidation and electron exposure SPL, probe tips must be electrically conductive and sharp to enable field concentration at the tip apex. For field emission of electrons from the tips, the workfunction of the tip material is significant. In the case of feedback control of the emitted current, the tips should be tall to ensure a small cantilever-to-sample capacitance. In this chapter we give details on different tip varieties: (1) “standard” silicon or metal-coated tips, (2) post-processed silicon tips, and (3) carbon nanotubes as scanning probe tips.
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