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Abstract
Nanometer size structures created by irradiation with 215 MeV Ne, and 209 MeV Kr ions on the surface of muscovite mica (MM), highly oriented pyrolitic graphite (HOPG), and single crystal Si were investigated by scanning tunnelling microscopy (STM), and atomic force microscopy (AFM). The comparison of the structures observed on these three materials shows that : (i) high energy heavy ions are suitable to produce well individualised, nanometer size structures without any further developing process being needed ; and (ii) the character of the structures can be ‘‘tailored’’ to a certain extent by using different target-ion combinations, and different angles of incidence.The layered nature of MM and HOPG make these materials particularly suitable for the creation of various nanometer size structures, their behaviour being more close to each other than to the covalent Si
Published Version
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