Abstract
Nitrogen-doped chemical vapour deposited diamond-like carbon (DLC) filmswere treated by reactive ion etching system under various conditions ofCHF3 gas successively after pre-treatment with oxygen. Atomic force microscopy and Ramanspectroscopy were carried out in order to characterize the surface morphology and chemicalbond, respectively. Scanning tunnelling microscopy was used in order to investigate thesurface state of the DLC films at the nanoscale level. Scanning probe field emission currentmeasurement was performed in order to obtain the emission current mapping.The emission sites appeared to a great extent after the surface treatment byCHF3 gas and a clear activation effect was observed. We confirmed that the surface treatment usingCHF3 gas affected not only the appearance of emission sites but also the activation process.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
