Abstract
In this paper, a novel type of scanning near-field millimeter-wave microscopy using a metal slit-type probe is proposed. A tapered reduced-height rectangular waveguide forms the slit aperture, which has a width much smaller than one wavelength /spl lambda/ and length of the order of /spl lambda/. The slit probe can be operated in the TE/sub 10/ mode and, thus, results in high transmission efficiency, even when the width is exceedingly small. An image reconstruction algorithm based on computerized tomographic imaging is used to obtain two-dimensional near-field images. Experiments performed at 60 GHz (/spl lambda/=5 mm) show that image resolution equal to the slit width (/spl sim/80 /spl mu/m) is achieved. As an application of this scanning slit microscopy, visualization of transition phenomena of photoexcited free carriers in silicon have been successfully demonstrated, yielding useful information on the dynamics of free carriers in semiconductor materials.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: IEEE Transactions on Microwave Theory and Techniques
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
