Scan angle error measurement based on phase-stepping algorithms in scanning beam interference lithography.

Abstract

In this paper, a doubled-period grating (DPG) method is proposed to measure the scan angle error in scanning beam interference lithography (SBIL), together with a high-resolution two-dimensional stage and phase-stepping algorithms. A reference grating, which was the doubled period of the interference field, is adapted to diffract the incident left and right beams to form an interferogram captured by a CCD camera. The phase-stepping algorithm was applied to calculate the phase of the interferogram. First, by translating the stage, the reference grating lines were adjusted parallel to the scan direction by comparing the phase of the interferogram between the starting point and the ending point. Next, by rotating the stage step by step, the phase of the interferogram was obtained at each step as well as the phase slope. The scan angle error was considered to be least when the slope was minimum. Finally, a grating mask with a size of 100×100 mm2 was fabricated to verify the feasibility of the method. The scan angle error was measured with a precision of less than 12.65 μrad, which indicates the effectiveness of the proposed method to fabricate high-quality gratings in the future.