Abstract
Electrostatic charge generation and accumulation in a:SiNx thin films irradiated by energetic (100 keV) electrons is investigated and kinetic equations describing the dynamic process are formulated. It is found that the incident electrons, inelastically scattered in the membrane, primarily generate plasmons. The plasmon decay creates electron-hole pairs and secondary electrons (SE). The escape of the SEs from the target leads to a positive electrostatic charge accumulation in the membrane. It is shown that SCALPEL^(R) mask-membrane charging is defined by the balance of the SE escape, hole trapping and transport processes.
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