Abstract
We study scaling properties of the surface morphology at epitaxial growth in a generalized phase-field model by taking into account dynamics of the adsorbate temperature. We have found that growth processes are defined by a set of roughness and growth exponents. It is shown that the growth rate of the averaged mean area of islands can be controlled by deposition flux, interaction strength of adsorbate and time scale for the temperature relaxation. We have shown, that both number of islands and average island size behave in a power-law form over exposing time. We have discussed two different numerical approaches allowing one to determine the distribution function of islands over sizes. Obtained distributions are universal and do not change with variation in main system parameters.
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