Abstract
The dynamics of paraffin deposit formation on different surfaces was analyzed based on scaling laws. Carbon-based films were deposited onto silicon (Si) and stainless steel substrates from methane (CH4) gas using radio frequency plasma enhanced chemical vapor deposition. The different substrates were characterized with respect to their surface energy by contact angle measurements, surface roughness, and morphology. Paraffin thin films were obtained by the casting technique and were subsequently characterized by an atomic force microscope in noncontact mode. The results indicate that the morphology of paraffin deposits is strongly influenced by substrates used. Scaling laws analysis for coated substrates present two distinct dynamics: a local roughness exponent (αlocal) associated to short-range surface correlations and a global roughness exponent (αglobal) associated to long-range surface correlations. The local dynamics is described by the Wolf–Villain model, and a global dynamics is described by the Kardar–Parisi–Zhang model. A local correlation length (Llocal) defines the transition between the local and global dynamics with Llocal approximately 700nm in accordance with the spacing of planes measured from atomic force micrographs. For uncoated substrates, the growth dynamics is related to Edwards–Wilkinson model.
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