Abstract
The Vertically Oriented Graphene Nanosheets (VGNs) possesses many promising properties and attracts intense interests in various applications due to its unique nanoarchitecture and intrinsic properties of graphene. However, a scalable growth of VGNs film with high rate is still an open challenge that hampers both the scientific research and mass applications. Herein, we report for the first time a large area growth of VGNs film with high rate via a high-density and high-flux mesoplasma chemical vapor deposition by rotating the substrate. A uniform VGNs film on a large area with a high growth rate on the order of ten micrometer per minute has been obtained. A continues growth process of VGNs film with high rate is also predicted by sweeping the substrate, which gives a new route for the scalable growth of VGNs film with high rate for the future mass applications.
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